STRUCTURE AND DYNAMICS OF STRONG CHEMISORPTION ON SI(111) AS MEASURED WITH ATOMIC HELIUM SCATTERING

被引：18

作者：

DOAK, RB

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 05期

关键词：

D O I：

10.1116/1.584470

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

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页码：1252 / 1259

页数：8

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