THE GROWTH-CHARACTERISTICS OF ION-BEAM SPUTTERED COCR FILMS ON TA ISOLATION LAYERS

被引：15

作者：

GILL, HS

YAMASHITA, T

机构：

[1] Hewlett-Packard Lab, Palo Alto, CA,, USA, Hewlett-Packard Lab, Palo Alto, CA, USA

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1984年 / 20卷 / 05期

关键词：

D O I：

10.1109/TMAG.1984.1063377

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

7

引用

收藏

页码：776 / 778

页数：3

相关论文

共 7 条

[1] MAGNETO-OPTIC KERR EFFECT IN RF SPUTTERED CO-CR FILM WITH PERPENDICULAR ANISOTROPY
ABE, M
SHONO, K
KOBAYASHI, K
GOMI, M
NOMURA, S
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1982, 21 (01): : L22 - L24
[2] BRAVMAN J, 1983, J ELEC MICROSC TECH, V1, P53
[3] ELECTRON MICROSCOPY ON HIGH-COERCIVE-FORCE CO-CR COMPOSITE FILMS
DAVAL, J
RANDET, D
[J]. IEEE TRANSACTIONS ON MAGNETICS, 1970, MAG6 (04) : 768 - &
[4] MAGNETIC AND STRUCTURAL CHARACTERISTICS OF ION-BEAM SPUTTER DEPOSITED CO-CR THIN-FILMS
GILL, HS
ROSENBLUM, MP
[J]. IEEE TRANSACTIONS ON MAGNETICS, 1983, 19 (05) : 1644 - 1646
[5] ANALYSIS FOR MAGNETIZATION MODE FOR HIGH-DENSITY MAGNETIC RECORDING
IWASAKI, S
NAKAMURA, Y
[J]. IEEE TRANSACTIONS ON MAGNETICS, 1977, 13 (05) : 1272 - 1277
[6] A NEW STRUCTURE IN TANTALUM THIN FILMS (VAPOR DEPOSITION SUPERCONDUCTIVITY SPUTTERING X-RAY DIFFRACTION E)
READ, MH
ALTMAN, C
[J]. APPLIED PHYSICS LETTERS, 1965, 7 (03) : 51 - &
[7] UESAKA Y, 1982, 1982 P SEND S PERP M, P169