INSITU GROWTH OF YBA2CU3O7-X HIGH-TC SUPERCONDUCTING THIN-FILMS DIRECTLY ON SAPPHIRE BY PLASMA-ENHANCED METALORGANIC CHEMICAL VAPOR-DEPOSITION

被引:21
作者
CHERN, CS
ZHAO, J
LI, YQ
NORRIS, P
KEAR, B
GALLOIS, B
机构
[1] EMCORE CORP,SOMERSET,NJ 08873
[2] RUTGERS STATE UNIV,PISCATAWAY,NJ 08854
关键词
D O I
10.1063/1.104258
中图分类号
O59 [应用物理学];
学科分类号
摘要
Highly c-axis oriented YBa2Cu3O7-x superconducting thin films have been, in situ, deposited directly on sapphire substrate by a remote microwave plasma-enhanced metalorganic chemical vapor deposition process (PE-MOCVD). The films were deposited at a substrate temperature of 730°C followed by a fast cooling. The as-deposited films show attainment of zero resistance at 82 K and have critical current density of 104 A/cm2 at 70 K. ac susceptibility measurement indicated that the films contain a single superconducting phase. PE-MOCVD was carried out in a commercial-scale MOCVD reactor with capability of uniform deposition over 100 cm2 per growth run.
引用
收藏
页码:721 / 723
页数:3
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