A QUANTITATIVE INVESTIGATION OF EMISSION FROM LOW-TEMPERATURE LASER-INDUCED YBA2CU3OX PLASMA PLUMES

被引：31

作者：

ELASTAL, AH

IKRAM, S

MORROW, T

GRAHAM, WG

WALMSLEY, DG

机构：

[1] Department of Pure and Applied Physics, Queens University of Belfast

来源：

JOURNAL OF APPLIED PHYSICS | 1995年 / 77卷 / 12期

关键词：

D O I：

10.1063/1.359529

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Quantitative emission spectroscopy has been used to study the plume formed following laser ablation of YBCO in an oxygen atmosphere. Excited state population distributions, determined from emission line intensity ratios, are used to investigate spatiotemporal variations in the local Boltzmann temperatures for both neutral and ionic species within the expanding plume. Temperatures, obtained from emission line intensity ratios of both Cu(I) and Y(I), decrease slowly and nonadiabatically in the range 1.0-0.5 eV during plume expansion. Higher initial Boltzmann temperatures of ∼3 eV are however obtained from the emission line intensity ratios of fast ions, which dominate the composition of the highly luminous expanding front of the plume. Quantitative comparison of emission intensities for the different neutral species present indicate that the neutral composition in the luminous region of the expanding plume is increasingly dominated by Cu(I) which has a faster expansion velocity and lower oxidation rate than Y(I) and Ba(I). © 1995 American Institute of Physics.

引用

页码：6572 / 6580

页数：9

共 24 条

[1]

Wu X.D., Dutta B., Hegde M.S., Inam A., Venkatesan T., Chase E.W., Chang C.C., Howard R., Appl. Phys. Lett., 54, (1989)

[2]

Saenger K.L., Proc. Adv. Mater, 3, (1993)

[3]

Sakeek H.F., Morrow T., Graham W.G., Walmsley D.G., J. Appl. Phys., 75, (1994)

[4]

Dyer P.E., Issa A., Key P.H., Appl. Phys. Lett., 57, (1990)

[5]

Singh R.K., Holland O.W., Narayan J., J. Appl. Phys., 68, (1990)

[6]

Singh R.K., Narayan J., Phys. Rev. B, 41, (1990)

[7]

Kools J.C.S., Baller T.S., De Zwart S.T., Dieleman J., J. Appl. Phys., 71, (1992)

[8]

Kelly R., Phys. Rev. A, 46, (1992)

[9]

Geohegan D.B., Pulsed Laser Deposition of Thin Films, (1994)

[10]

Auciello O., Athavale S., Hankins O.E., Sito M., Schreiner A.F., Biunno N., Appl. Phys. Lett., 53, (1988)

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