YBA2CU3O7-X THIN-FILM DEPOSITION BY MOCVD FOR MICROWAVE APPLICATIONS

被引：1

作者：

DUBOURDIEU, C ^{[1
]}

CHENEVIER, B ^{[1
]}

SENATEUR, JP ^{[1
]}

THOMAS, O ^{[1
]}

机构：

[1] FAC SCI & TECH ST JEROME,MATOP LAB,F-13397 MARSEILLE 20,FRANCE

来源：

PHYSICA C | 1994年 / 235卷

关键词：

D O I：

10.1016/0921-4534(94)91550-4

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

YBa2Cu3O7-x thin films have been deposited by Metal Organic Chemical Vapor Deposition (MOCVD) simultaneously on (001) MgO, (001) SrTiO3 and (012) LaAlO3 substrates. A comparison of the properties of two sets of samples has been done. The microstructures induced by the different substrates have been studied by SEM and X ray diffraction. The morphology is very sensitive to the nature of the substrate and to the overall composition of the films. The films are strongly textured, with the c axis perpendicular to the substrate but ''a axis grains'' are observed when the ratio Ba/Y is above 2. The highest critical temperatures and lowest resistivities are obtained on SrTiO3 and LaAlO3, with T-c similar to 89 K and rho(100 K) (similar to) 90 mu Omega.

引用

页码：653 / 654

页数：2