LO-PHONON PLASMON MODES IN N-GAAS AND N-INP UNDER PRESSURE

被引:5
作者
ERNST, S
GONI, AR
SYASSEN, K
CARDONA, M
机构
[1] Max-Planck-Institut für Festkörperforschung, 70569 Stuttgart
关键词
SEMICONDUCTORS; HIGH PRESSURE; RAMAN SPECTROSCOPY; LUMINESCENCE; PLASMON MODES;
D O I
10.1016/0022-3697(94)00242-8
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We have investigated the effect of hydrostatic pressure on coupled longitudinal optical (LO)-phonon-plasmon modes and Fermi energies in heavily doped n-GaAs and n-InP using Raman scattering and photoluminescence (PL) spectroscopy at T = 6 K. The combined Raman and PL data allow us to determine both the free carrier density and electron effective mass of the Gamma conduction band minimum as a function of pressure. Near the pressure-induced Gamma-X conduction band crossover both materials exhibit striking changes in the coupled mode frequencies, which are caused by the transfer of electrons from Gamma to X minima. The onset pressure of the electron transfer in n-InP is used to determine the Gamma-X crossover pressure P-c = 11.1 +/- 0.4 GPa, in undoped InP.
引用
收藏
页码:567 / 570
页数:4
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