FURTHER PROPERTIES + SUGGESTED MODEL FOR NIOBIUM OXIDE NEGATIVE RESISTANCE

被引：11

作者：

BEAM, WR

ARMSTRONG, AL

机构：

来源：

关键词：

D O I：

10.1109/PROC.1964.2873

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：300 / &

共 6 条

[1] CORRECTED VALUES OF FOWLER-NORDHEIM FIELD EMISSION FUNCTIONS V(Y) AND S(Y)
BURGESS, RE
KROEMER, H
HOUSTON, JM
[J]. PHYSICAL REVIEW, 1953, 90 (04): : 515 - 515
[2] CURRENT-CONTROLLED NEGATIVE RESISTANCE IN THIN NIOBIUM OXIDE FILMS
CHOPRA, KL
[J]. PROCEEDINGS OF THE IEEE, 1963, 51 (06) : 941 - &
[3] FOWLER RH, 1928, P ROY SOC LONDON, VA119, P173
[4] A NEW NEGATIVE-RESISTANCE DEVICE
GEPPERT, DV
[J]. PROCEEDINGS OF THE IEEE, 1963, 51 (01) : 223 - &
[5] HICKMOTT TW, 1962, J APPL PHYS, V33, P2569
[6] Young L, 1961, ANODIC OXIDE FILMS