ASYMPTOTIC-BEHAVIOR OF PARTICLE DEPOSITION

被引：58

作者：

SCHAAF, P ^{[1
]}

JOHNER, A ^{[1
]}

TALBOT, J ^{[1
]}

机构：

[1] PURDUE UNIV,SCH IMMUNOGENET,W LAFAYETTE,IN 47907

来源：

PHYSICAL REVIEW LETTERS | 1991年 / 66卷 / 12期

关键词：

D O I：

10.1103/PhysRevLett.66.1603

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The kinetics of the deposition or adsorption of large spheres onto a solid surface is investigated theoretically. Unlike previous models, the interaction between the adsorbed and the bulk particles is considered explicitly. It is shown that in the asymptotic regime (large coverage) the coverage approaches its saturation value according to the power law rho(infinity) - rho(t) approximately t -2/3, the exponent of which is different from that predicted by the random sequential adsorption model.

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页码：1603 / 1605

页数：3

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