NATURE OF OBSTACLES TO DISLOCATION MOTION IN CU AND CU-SI SOLID SOLUTIONS

被引:26
作者
EVANS, KR
FLANAGAN, WF
机构
[1] The Boeing Company, Seattle, WA
[2] University of Washington, Seattle, WA
[3] The Shell Development Company, Emeryville, CA
[4] The General Motors Technical Center, Warren, MI
来源
PHILOSOPHICAL MAGAZINE | 1968年 / 17卷 / 147期
关键词
D O I
10.1080/14786436808217741
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The nature of obstacles to dislocation motion in copper single crystals has been studied by determining their effective retarding force–distance relationship as a function of solute content (up to 7 a/o silicon) and state of deformation. The obstacle energy is found to be 0·67 ev ± 0·06 ev, independent of solute content and state of deformation. While the rate-controlling barrier is independent of solute content and state of deformation, the athermal portion of the internal retarding force is observed to increase with state of deformation but to decrease markedly with increasing solute content. The results are consistent with a dislocation intersection mechanism which is discussed in detail. © 1968 Taylor & Francis Group, LLC.
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页码:535 / &
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