PARASITIC TRANSIENTS INDUCED BY FLOATING SUBSTRATE EFFECT AND BIPOLAR-TRANSISTOR ON SOI TECHNOLOGIES

被引:6
作者
LEROUX, C
GAUTIER, J
AUBERTONHERVE, AJ
GIFFARD, B
SPALANZANI, M
机构
[1] DTA LETI, CENG, 38041 Grenoble Cédex
[2] T.M.S., 38521 Saint-Egreve Cedex, Avenue de Rocheplaine
关键词
Semiconductor Materials - Analysis;
D O I
10.1016/0167-9317(91)90212-V
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, we are dealing with consequences of the existence of parasitic bipolar[l] and kink effect[2] on transients occurring in SOI digital circuits. The two effects described below have been studied on NMOS transistors on SOI technology. To facilitate the acquisition of the different transients, we have used large transistors (7000-mu-m for the first, and 100-mu-m for the second) with nominal gate length (1.4-mu-m). To characterize the first effect, we have used NMOS transistors with body ties. These ties are realized with P+ implantation in the N+ source diffusions, one body tie per ten microns of channel width. The kink effect induced transients have been characterized on usual NMOS transistors without tie.
引用
收藏
页码:199 / 202
页数:4
相关论文
共 2 条
[1]  
Colinge, An SOI voltage-controlled bipolar MOS device, 34 IEE ED, pp. 845-849, (1987)
[2]  
Tihanyi, Schlotterer, Properties of ESFI MOS transistors due to the floating substrate and the finite volume, 22 IEEE ED, No11, pp. 309-314, (1975)