DIFFERENTIAL REFLECTION SPECTRA OF HEAVILY DOPED SILICON AND GERMANIUM IN ULTRAVIOLET SPECTRAL REGION

被引:7
作者
VOLFSON, AA
SUBASHIEV, VK
机构
[1] Institute of Semiconductors, Academy of Sciences of the Ussr
来源
PHYSICA STATUS SOLIDI | 1969年 / 33卷 / 01期
关键词
D O I
10.1002/pssb.19690330112
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The effect of heavy doping on the reflection spectra of silicon and germanium is investigated by measuring the fractional change in reflectance, ΔR/R, between pure and doped materials. This effect arises from the narrowing of the forbidden gap in heavily doped materials. The form of the ΔR/R spectrum allows to reveal the critical points of the band structure, as in electro‐, piezo‐, or thermoreflectance measurements. Copyright © 1969 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim
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页码:149 / +
页数:1
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