PITTING POTENTIAL AND STRUCTURE OF SPUTTER-DEPOSITED AL-TI ALLOYS

被引：24

作者：

YOSHIOKA, H ^{[1
]}

YAN, Q ^{[1
]}

ASAMI, K ^{[1
]}

HASHIMOTO, K ^{[1
]}

机构：

[1] TOHOKU UNIV,INST MAT RES,SENDAI,MIYAGI 980,JAPAN

来源：

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 1991年 / 134卷

关键词：

D O I：

10.1016/0921-5093(91)90923-B

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Alloys containing up to 49 at.% titanium have been investigated. The alloys containing 31.7 at.% or more titanium became amorphous. The solid solubility of titanium in aluminum was extended by sputter deposition beyond the value obtained by rapid solidification. The second f.c.c. phase as well as alpha-Al phase appeared when the alloys contained 18.5 at.% or more titanium. The lattice constant of the alpha-Al phase continuously decreased with increasing titanium content in this region. The pitting potentials of sputter-deposited Al-Ti alloys in a neutral borate-boric acid solution containing Cl- ions are continuously raised with titanium content of the alloy, and are significantly high in comparison with those of rapidly solidified and conventionally cast alloys. The amorphous alloys showed very high pitting potentials. No discontinuity in the pitting potential of the crystalline alloys was observed in spite of appearance of the second f.c.c. phase mostly due to the enhancement of corrosion resistance of the alpha-Al phase based on supersaturation with titanium.

引用

页码：1054 / 1057

页数：4

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