HOLOGRAPHIC INVESTIGATION OF RESIDUAL DEFORMATIONS INDUCED BY A PULSED ION IMPLANTER

被引：7

作者：

KAUFMANN, GH ^{[1
]}

FEUGEAS, JN ^{[1
]}

MARINO, B ^{[1
]}

GALIZZI, GE ^{[1
]}

机构：

[1] UNIV NACL ROSARIO,CONSEJO NACL INVEST CIENT & TECN,ROSARIO INST PHYS,PLASMA PHYS GRP,RA-2000 ROSARIO,ARGENTINA

来源：

APPLIED OPTICS | 1991年 / 30卷 / 01期

关键词：

D O I：

10.1364/AO.30.000085

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A new use of holographic interferometry to investigate the residual deformations induced in nitrogen implanted specimens by a plasma focus device is reported. The method is simple and nondestructive. Experimental results obtained for AISI 304 stainless stell specimens are presented.

引用

页码：85 / 89

页数：5

共 8 条

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ABRAMSON, N .

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[2]

Caulfield H.J., 1979, HDB OPTICAL HOLOGRAP, V1st ed.

[3]

Erf R., 1974, HOLOGRAPHIC NONDESTR

[4] THE INFLUENCE OF THE INSULATOR SURFACE IN THE PLASMA-FOCUS BEHAVIOR [J].

FEUGEAS, JN .

JOURNAL OF APPLIED PHYSICS, 1989, 66 (08) :3467-3471

[5]

FEUGEAS JN, 1989, J APPL PHYS, V64, P2648

[6]

MATHER JW, 1971, METHODS EXPT PHYSI B, V9

[7]

Nardi V, 1979, PLASMA PHYS CONTROLL, V2, P143

[8]

Vest CM., 1979, HOLOGRAPHIC INTERFER, V1

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