COMPARISON OF IMAGE SHORTENING EFFECTS IN X-RAY AND OPTICAL LITHOGRAPHY

被引：9

作者：

DELLAGUARDIA, R

MALDONADO, JR

PREIN, F

ZELL, T

KLUWE, A

OERTEL, HK

机构：

[1] SIEMENS CORP,PRINCETON,NJ 08540

[2] FRAUNHOFER INST SILIZIUMTECHNOL,D-14199 BERLIN 33,GERMANY

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.587578

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：3936 / 3942

页数：7

共 11 条

[1]

AUSSCHNITT K, COMMUNICATION

[2] DERIVATION AND SIMULATION OF HIGHER NUMERICAL APERTURE SCALAR AERIAL IMAGES [J].

COLE, DC ;

BAROUCH, E ;

HOLLERBACH, U ;

ORSZAG, SA .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1992, 31 (12B) :4110-4119

[3] DIFFRACTION EFFECTS AND IMAGE BLURRING IN X-RAY PROXIMITY PRINTING [J].

DUBNER, AD ;

WAGNER, A ;

LEVIN, JP ;

MAUER, J .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (06) :3212-3216

[4]

Ferguson R. M., UNPUB

[5]

LEAVEY JA, IBM J RES DEV, V37, P385

[6]

MARTINO R, IN PRESS P SPIE

[7]

POMERENE A, 1993, P SPIE, V1924

[8] OVERLAY PERFORMANCE OF X-RAY STEPPERS IN IBM ADVANCE LITHOGRAPHY FACILITY [J].

PROGLER, CJ ;

CHEN, AC ;

GUNTHER, TA ;

KAISER, P ;

COOPER, KA ;

HUGHLETT, RE .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06) :2888-2896

[9]

SOHN CJ, IN PRESS P SPIE

[10]

WEISS M, 1987, MICROELECTRON ENG, V6, P2665

← 1 2 →