A STUDY OF AGGLOMERATION AND RELEASE PROCESSES OF HELIUM IMPLANTED IN NICKEL BY A VARIABLE ENERGY POSITRON BEAM

被引：38

作者：

TANIGAWA, S ^{[1
]}

IWASE, Y ^{[1
]}

UEDONO, A ^{[1
]}

SAKAIRI, H ^{[1
]}

机构：

[1] INST PHYS & CHEM RES,WAKO,SAITAMA 351,JAPAN

来源：

关键词：

D O I：

10.1016/0022-3115(85)90190-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：463 / 467

页数：5

共 9 条

[1] LINDHARD J, 1963, DAN VID SELSK MAT FY, V33
[2] SLOW-POSITRON APPARATUS FOR SURFACE STUDIES
LYNN, KG
LUTZ, H
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1980, 51 (07) : 977 - 982
[3] TRANSMISSION ELECTRON-MICROSCOPY STUDY OF MOLYBDENUM IRRADIATED WITH HELIUM IONS
MAZEY, DJ
EYRE, BL
EVANS, JH
ERENTS, SK
MCCRACKEN, GM
[J]. JOURNAL OF NUCLEAR MATERIALS, 1977, 64 (1-2) : 145 - 156
[4] MILLS AP, 1982, POSITRON ANNIHILATIO, P142
[5] SIEGEL RW, 1982, POSITRON ANNIHILATIO, P351
[6] Tanigawa S., 1982, POSITRON ANNIHILATIO, P401
[7] Triftshauser W., 1982, Point Defects and Defect Interactions in Metals. Proceedings of the Yamada Conference V, P15
[8] TRIFTSHAUSER W, 1982, POSITRON ANNIHILATIO, P142
[9] VYATSKIN AY, 1978, SOV PHYS SOLID STATE, V19, P2019