THE OXIDATION OF SPUTTERED TANTALUM FILMS

被引：11

作者：

BASSECHES, H

机构：

来源：

关键词：

D O I：

10.1149/1.2425450

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：475 / 479

页数：5

共 25 条

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[2]

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CATHCART, JV ;

BAKISH, R ;

NORTON, DR .

[5]

CHARLES RG, 1958, T AM I MIN MET ENG, V212, P101

[6]

Darken L. S., 1953, PHYSICAL CHEM METALS, P446

[7]

Evans U. R., 1960, CORROSION OXIDATION, P819

[8]

GEBHARDT E, 1957, Z METALLKD, V48, P624

[9] OXIDATION OF NIOBIUM BETWEEN 375-DEGREES-C AND 700-DEGREES-C [J].

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ANDREW, KF .

GULBRANSEN, EA ;

ANDREW, KF .