THE HYDROGEN ELECTRODE-REACTION CHARACTERISTICS OF THIN-FILM ELECTRODES OF NI-BASED HYDROGEN STORAGE ALLOYS

被引：42

作者：

MACHIDA, K

ENYO, M

ADACHI, G

SHIOKAWA, J

机构：

[1] HOKKAIDO UNIV,CATALYSIS RES INST,SAPPORO,HOKKAIDO 060,JAPAN

[2] OSAKA UNIV,FAC ENGN,DEPT APPL CHEM,SUITA,OSAKA 565,JAPAN

来源：

ELECTROCHIMICA ACTA | 1984年 / 29卷 / 06期

关键词：

D O I：

10.1016/0013-4686(84)80018-3

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：807 / 815

页数：9

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