MAGNETORESISTANCE IN ELECTRODEPOSITED NI-FE-CU/CU MULTILAYERS

被引:43
作者
ATTENBOROUGH, K [1 ]
HART, R [1 ]
LANE, SJ [1 ]
ALPER, M [1 ]
SCHWARZACHER, W [1 ]
机构
[1] UNIV BRISTOL,DEPT GEOL,BRISTOL BS8 1RJ,AVON,ENGLAND
基金
英国工程与自然科学研究理事会;
关键词
D O I
10.1016/0304-8853(95)89007-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Multilayers of Ni-Fe-Cu/Cu have been electrodeposited from a single electrolyte onto polycrystalline (100) textured and (100) single crystal copper substrates. Bilayer thicknesses as low as 30 Angstrom have been achieved, as confirmed by X-ray diffraction. Room temperature magnetoresistance measurements show the presence of giant magnetoresistance (GMR) and an anisotropic magnetoresistance (AMR) component in the films.
引用
收藏
页码:335 / 336
页数:2
相关论文
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