DEPOSITION OF SILICA FILMS BY GLOW DISCHARGE TECNIQUE

被引：68

作者：

SECRIST, DR

MACKENZIE, JD

机构：

来源：

关键词：

D O I：

10.1149/1.2424155

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：914 / +

页数：1

共 21 条

[1] LOW-TEMPERATURE DEPOSITION OF SILICON OXIDE FILMS [J].

ALT, LL ;

ING, SW ;

LAENDLE, KW .

[2] CHEMICAL NATURE OF SILICA CARRIED BY STEAM [J].

BRADY, EL .

[3]

BREWER L, 1952, THESIS U CALIFORNIA

[4]

BRUNAUER S, ADSORPTION GASES VAP, V1, P244

[5]

BRUNAUER S, ADSORPTION GASES VAP, V1, P245

[6]

COTTRELL TL, 1958, STRENGTHS CHEM BONDS, P160

[7]

DONDES S, PRIVATE COMMUNICATIO

[8]

FROST AA, 1961, KINETICS MECHANISM, P262

[9] SURFACE HYDRATION OF SILICAS [J].

HOCKEY, JA ;

PETHICA, BA .

TRANSACTIONS OF THE FARADAY SOCIETY, 1961, 57 (12) :2247-&

ING, SW ;

DAVERN, W .