NOVEL PLASMA CHEMICAL TECHNOLOGIES - PPCP AND SPCP FOR CONTROL OF GASEOUS-POLLUTANTS AND AIR TOXICS

被引：69

作者：

MASUDA, S

HOSOKAWA, S

TU, X

WANG, Z

机构：

[1] Masuda Research, Inc., Bunkyo-ku, Tokyo, 113, Kaneyasu Building, 6F1., 2-40-11, Hongo

来源：

JOURNAL OF ELECTROSTATICS | 1995年 / 34卷 / 04期

关键词：

D O I：

10.1016/0304-3886(94)00027-T

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The pulse corona induced plasma chemical process (PPCP) and the surface discharge induced plasma chemical process (SPCP) represent novel technologies for generating copious active radicals under ordinary temperature and pressure for control of gaseous pollutants (NO(x), SO(x), VOCs) and air toxics (Hg and other readily vaporized metals, trichloroethane, trichloroethylene, freons, toluene, dioxines, etc.) as well as odors. PPCP and SPCP are completely dry processes having a simple construction, and their overall cost (both initial and running) is one of the lowest among the processes for control of gaseous pollutants. They can be combined with a wet ESP, a bag-filter with absorbent powder coat, a catalyst bed, or an active charcoal bed for the final removal of the reaction products.

引用

页码：415 / 438

页数：24

共 11 条

[1]

Masuda, Report on Novel Dry DeNOx/DeSOx Technology for Cleaning Combustion Gases from Utility Thermal Power Plants, NATO ASI Series, 34 G, pp. 131-137, (1993)

[2]

Masuda, Hosokawa, Tu, Wang, Novel plasma technologies for pollution control, proc. 2nd Int. Conf. on Applied Electrostatics, '93, pp. 1-24, (1993)

[3]

Masuda, Nakao, Control of NOx by positive and negative pulsed corona discharges, IEEE IA-Trans., 26, 2, (1990)

[4]

Masuda, Wu, Urabe, Ono, Pulse corona induced plasma chemical process for DeNOx, DeSOx and mercury vapor control, Proc. 3rd. Int. Conf. on Electrostatic Precipitation, pp. 667-676, (1987)

[5]

Masuda, Hosokawa, Tu, Sakakibara, Kitoh, Sakai, Destruction of gaseous pollutants by surface discharge induced plasma chemical process (SPCP), IEEE IA-Trans., 29, 4, (1993)

[6]

Oda, Takahashi, Nakano, Masuda, Decomposition of fluorocarbon gaseous contaminants by surface discharge-induced plasma chemical processing, IEEE IA-Trans., 29, 4, (1993)

[7]

Masuda, Hosokawa, Tochizawa, Akutsu, Kuwano, Iwata, Surface treatment of plastic material by pulse corona induced plasma chemical process - PPCP, IEEE IA-Trans., 30, 2, (1994)

[8]

Yamamoto, Masuda, Electrostatic deposition of CVD particles for fabrication of ultraliine ceramic filter, IEEE IA-Trans., 27, 2, (1991)

[9]

Masuda, Akutsu, Kuroda, Awatsu, Shibuya, A ceramic-based ozonizer using high-frequency surface discharge, IEEE IA-Trans., 24, 2, (1988)

[10]

Oda, Yamashita, Haga, Takahashi, Masuda, Decomposition of gaseous organic contaminants by surface discharge induced plasma chemical processing, Proc. IEEE/IAS Annu. Conf., (1992)

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