THE 1ST INTERLAYER SPACING OF TA(100) DETERMINED BY PHOTOELECTRON DIFFRACTION

被引：29

作者：

BARTYNSKI, RA

HESKETT, D

GARRISON, K

WATSON, G

ZEHNER, DM

MEI, WN

TONG, SY

PAN, X

机构：

[1] UNIV PENN,DEPT PHYS,PHILADELPHIA,PA 19104

[2] OAK RIDGE NATL LAB,DIV SOLID STATE,OAK RIDGE,TN 37831

[3] UNIV NEBRASKA,DEPT PHYS,OMAHA,NE 68182

[4] UNIV WISCONSIN,DEPT PHYS,MILWAUKEE,WI 53201

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期

关键词：

D O I：

10.1116/1.575988

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1931 / 1936

页数：6

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