ADSORPTION AND THERMAL-STABILITY OF MN ON TIO2(110) - 2P X-RAY-ABSORPTION SPECTROSCOPY AND SOFT-X-RAY PHOTOEMISSION

被引：19

作者：

DIEBOLD, U ^{[1
]}

SHINN, ND ^{[1
]}

机构：

[1] SANDIA NATL LABS, ALBUQUERQUE, NM 87518 USA

来源：

SURFACE SCIENCE | 1995年 / 343卷 / 1-2期

关键词：

GROWTH; LOW INDEX SINGLE CRYSTAL SURFACES; MANGANESE; METAL-INSULATOR INTERFACES; PHOTOEMISSION; SINGLE CRYSTAL EPITAXY; SOFT X-RAY PHOTOELECTRON SPECTROSCOPY; TITANIUM OXIDE; X-RAY ABSORPTION SPECTROSCOPY;

D O I：

10.1016/0039-6028(95)00780-6

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

X-ray absorption and photoelectron spectroscopies are used to study the adsorption and reaction of Mn films deposited on TiO2(110) at 25 degrees C and after annealing to similar to 650 degrees C. Fractional monolayer coverages of Mn at 25 degrees C produce a reactive, disordered interface consisting of reduced Ti cations and oxidized Mn overlayer atoms. Metallic Mn is found only for thicker layers at 25 degrees C. Annealing Mn films to -650 degrees C leads to several changes that are largely independent of initial overlayer coverage: Metallic Mn thermally desorbs leaving only Mn2+ ions; interfacial Ti cations are largely re-oxidized to the Ti4+ state; and the local order is increased at the interface. The formation of a crystalline ternary surface oxide, MnTiOx, is proposed to account for these chemical and structural changes.

引用

页码：53 / 60

页数：8

共 38 条

[1]

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