LOW RESISTANCE OHMIC CONTACTS TO HIGH-TC SUPERCONDUCTING THIN-FILMS

被引:6
作者
TAZOH, Y
AIHARA, K
MIYABARA, K
HOHKAWA, K
OSHIMA, M
机构
关键词
D O I
10.1109/20.92712
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:2049 / 2052
页数:4
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