SUBHARMONICS AND RF-PLASMA SHEATHS

被引：24

作者：

MILLER, PA ^{[1
]}

ROMERO, LA ^{[1
]}

POCHAN, PD ^{[1
]}

机构：

[1] GEOCENTERS INC,ALBUQUERQUE,NM 87106

来源：

PHYSICAL REVIEW LETTERS | 1993年 / 71卷 / 06期

关键词：

D O I：

10.1103/PhysRevLett.71.863

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Period doubling and concomitant subharmonic generation have been reported in rf-excited plasmas. We show that this phenomenon is caused by the nonlinear interaction of the plasma-sheath capacitance with the external rf power circuits. As a result, changes in the external circuits can be used to control period doubling. Sheath capacitance can be derived from electrical measurements of period doubling.

引用

页码：863 / 866

页数：4

共 20 条

[1] SHEATH VOLTAGE RATIO FOR ASYMMETRIC RF DISCHARGES [J].