ELECTRICAL TRANSPORT-PROPERTIES OF HIGH-RESISTANCE CR-SI-O THIN-FILMS

被引：21

作者：

GLADUN, C

HEINRICH, A

LANGE, F

SCHUMANN, J

VINZELBERG, H

机构：

[1] Akad der Wissenshaften der DDR,, Zentralinstitut fuer, Festkoerperphysik und, Akad der Wissenshaften der DDR, Zentralinstitut fuer Festkoerperphysik und Werkstofforschung, Dresd

来源：

THIN SOLID FILMS | 1985年 / 125卷 / 1-2期

关键词：

METAL-SEMICONDUCTOR TRANSITION - OXYGEN CONTENTS - RUTHERFORD BACKSCATTERING;

D O I：

10.1016/0040-6090(85)90401-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：101 / 106

页数：6

共 16 条

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