COORDINATION AND BOND CHARACTER OF SILICON AND ALUMINUM IONS IN AMORPHOUS THIN-FILMS IN THE SYSTEM SIO2-AL2O3

被引：28

作者：

HANADA, T

SOGA, N

机构：

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1982年 / 65卷 / 06期

关键词：

D O I：

10.1111/j.1151-2916.1982.tb10456.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：C84 / C86

页数：3

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