COORDINATION AND BOND CHARACTER OF SILICON AND ALUMINUM IONS IN AMORPHOUS THIN-FILMS IN THE SYSTEM SIO2-AL2O3

被引:28
作者
HANADA, T
SOGA, N
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D O I
10.1111/j.1151-2916.1982.tb10456.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
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页码:C84 / C86
页数:3
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