PRODUCTION OF HIGH-PURITY VANADIUM, CHROMIUM AND TITANIUM FOR USE IN LOW ACTIVATION MATERIALS

被引：10

作者：

MURPHY, D ^{[1
]}

BUTTERWORTH, GJ ^{[1
]}

机构：

[1] UKAEA FUS,CULHAM LAB,ABINGDON OX14 3DB,OXON,ENGLAND

来源：

JOURNAL OF NUCLEAR MATERIALS | 1992年 / 191卷

关键词：

D O I：

10.1016/0022-3115(92)90714-V

中图分类号：

T [工业技术];

学科分类号：

08 [工学];

摘要：

The presence of radiologically potent tramp elements must be strictly controlled if the intrinsic low activation properties of alloys based on vanadium and chromium are to be fully realised. In this study the incidence of critical impurity elements in commercial sources of vanadium, chromium and titanium metals and precursor compounds is investigated using techniques for trace element analysis. MaxiMUM permitted concentrations corresponding to the attainment of the "hands-on" dose rate limit of 25 muSvh-1 after 100 yr cooling of first wall material were adopted as target values. Chromium and titanium from commercial sources are able to satisfy the purity target. Commercially available vanadium may contain unacceptable levels of Mo, Ag, Nb or Co and additional purification steps designed to remove these impurities are described.

引用

页码：1444 / 1449

页数：6

共 8 条

[1]

BROWN D, 1975, COMPREHENSIVE INORGA, V23, P592

[2]

HAHN R, 1985, METALL, V8, P39

[3]

UBER DIE EINWIRKUNG VON THIONYLCHLORID AUF OXYDE [J].

HECHT, H ;

JANDER, G ;

SCHLAPMANN, H .

ZEITSCHRIFT FUR ANORGANISCHE CHEMIE, 1947, 254 (5-6) :255-264

[4]

KHURSHEED A, 1988, THESIS IMPERIAL COLL

[5]

KONDO M, 1990, J MET, V11, P36

[6]

VANADIUM - AN OVERVIEW OF INDUSTRIAL CAPACITY AND OTHER FACTORS [J].

PETERSON, JR ;

SMATHERS, DB .

JOURNAL OF NUCLEAR MATERIALS, 1986, 141 (pt B) :1113-1116

[7]

ROSENBAUM JB, 1957, 5322 US BUR MIN REP, P36

[8]

ROSENBAUM JB, 1983, ENCY CHEM TECHNOLOGY, V23, P697

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