PREPARATION OF ND-DOPED SIO2 GLASS BY PLASMA TORCH CVD

被引：28

作者：

NAMIKAWA, H ^{[1
]}

ARAI, K ^{[1
]}

KUMATA, K ^{[1
]}

ISHII, Y ^{[1
]}

TANAKA, H ^{[1
]}

机构：

[1] SCI UNIV TOKYO,NODA,CHIBA 278,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1982年 / 21卷 / 06期

关键词：

D O I：

10.1143/JJAP.21.L360

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L360 / L362

页数：3

共 8 条

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[4] HIRAYAMA C, 1964, PHYS CHEM GLASSES-B, V5, P44
[5] DEPENDENCE OF 4F3-2 -] 4I11-2 INDUCED-EMISSION CROSS-SECTION FOR ND3+ ON GLASS COMPOSITION
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[J]. IEEE JOURNAL OF QUANTUM ELECTRONICS, 1976, 12 (02) : 102 - 111
[6] Moriarty J. L., 1963, J CHEM ENG DATA, V8, P422
[7] SNITZER E, 1967, GLASS IND SEP, P498
[8] NEODYMIUM-DOPED SILICA LASERS IN END-PUMPED FIBER GEOMETRY
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[J]. APPLIED PHYSICS LETTERS, 1973, 23 (07) : 388 - 389