ESTIMATE OF THE ELECTRON POWER DEPOSITION PROFILE IN CHS

被引：1

作者：

IWASE, M ^{[1
]}

KUBO, S ^{[1
]}

KUMAZAWA, R ^{[1
]}

IDEI, H ^{[1
]}

OHKUBO, K ^{[1
]}

MUTOH, T ^{[1
]}

WATARI, T ^{[1
]}

NISHIMURA, K ^{[1
]}

OKAMURA, S ^{[1
]}

MATSUOKA, K ^{[1
]}

MINAMI, T ^{[1
]}

YAMADA, I ^{[1
]}

NARIHARA, K ^{[1
]}

IDA, K ^{[1
]}

IGUCHI, H ^{[1
]}

机构：

[1] NATL INST FUS SCI,NAGOYA,AICHI 46401,JAPAN

来源：

FUSION TECHNOLOGY | 1995年 / 27卷

关键词：

D O I：

10.13182/FST95-A11947080

中图分类号：

TL [原子能技术]; O571 [原子核物理学];

学科分类号：

0827 ; 082701 ;

摘要：

The electron power deposition profile has been estimated experimentally during the ion cyclotron range of frequency (ICRF) heating and the electron cyclotron resonance heating (ECRH) in the compact helical system (CHS). The time evolution of the local electron temperature is measured from the second harmonic electron cyclotron emission (ECE) using super heterodyne radiometer. The absorbed power by electrons has been derived from the change in the slopes of the local electron temperature just before and after the input power is turned off. The power deposition profiles of electrons are compared with results from the calculation code in ICRF experiment. Those results show good agreement. In the ECRH experiment the input power is modulated to reduce the power deposition profile. Those analyses give results that the input power is absorbed around rho=0.6.

引用

页码：248 / 251

页数：4

共 4 条

[1] ABSORPTION OF A PLASMA OF FINITE DENSITY AROUND THE ELECTRON-CYCLOTRON HARMONICS [J].