ANALYSIS OF A REACTIVE SPUTTER ION PLATING DISCHARGE FOR TIN DEPOSITION USING OPTICAL-EMISSION SPECTROSCOPY

被引:14
作者
RICARD, A [1 ]
MICHEL, H [1 ]
JACQUOT, P [1 ]
GANTOIS, M [1 ]
机构
[1] ECOLE NATL SUPER MET & IND MINES,CNRS,GENIE MET LAB 159,F-54042 NANCY,FRANCE
关键词
D O I
10.1016/0040-6090(85)90030-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
7
引用
收藏
页码:67 / 73
页数:7
相关论文
共 7 条
[1]   MICROANALYSIS OF NITROGEN BY MEANS OF DIRECT OBSERVATION OF NUCLEAR REACTIONS . APPLICATIONS [J].
AMSEL, G ;
DAVID, D .
REVUE DE PHYSIQUE APPLIQUEE, 1969, 4 (03) :383-&
[2]  
BERNERON R, 1979, 19TH P INT HEAT TREA, P45
[3]   THE ACTIVATED REACTIVE EVAPORATION PROCESS - DEVELOPMENTS AND APPLICATIONS [J].
BUNSHAH, RF .
THIN SOLID FILMS, 1981, 80 (1-3) :255-261
[4]  
DORODNOV AM, 1978, J TECH PHYS, V9, P48
[5]  
MICHEL H, 1984, MAY HEAT TREATM 84 L
[6]   EMISSION-SPECTROSCOPY STUDY OF N-2-H-2 GLOW-DISCHARGE FOR METAL-SURFACE NITRIDING [J].
PETITJEAN, L ;
RICARD, A .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1984, 17 (05) :919-929
[7]  
TEER DC, 1983, 1983 P INT ION ENG C, P855