EFFICIENCY ENHANCEMENT OF DIFFRACTIVE OPTICAL-ELEMENTS BY VARIABLE RELIEF PROFILING

被引：4

作者：

STEMMER, A

ZARSCHIZKY, H

KNAPEK, E

LEFRANC, G

MAYERHOFER, F

机构：

[1] Siemens Corporate Research and Development, D-81730 München, ZFE ST KM 55

来源：

MICROELECTRONIC ENGINEERING | 1995年 / 27卷 / 1-4期

关键词：

D O I：

10.1016/0167-9317(94)00082-6

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Diffractive optical elements (DOEs) are realized with various reliefs using e-beam lithography and existing methodes for the production of microelectronic components. Depending on the 3D-profile, diffraction efficiencies of more than 70% for DOEs with high numerical aperture of 0.5 were measured and aberration-free imaging was observed. In order to enhance the diffraction efficiency we present different methods for a flexible 3D-shaping of the resist mask for the dry etching process.

引用

页码：171 / 174

页数：4