PHOTORESPONSE OF ION-BEAM-DEPOSITED Y-BA-CU-O THIN-FILMS

被引：1

作者：

LI, K

HSIAO, R

TANG, C

机构：

[1] Boeing Aerospace and Electronics, High Technology Center, Seattle

来源：

JOURNAL OF APPLIED PHYSICS | 1990年 / 68卷 / 06期

关键词：

D O I：

10.1063/1.346397

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report on the microstructure and photoresponse of ion-beam-deposited Y-Ba-Cu-O granular thin films. High-temperature superconductor thin films of the average composition YBa1.8Cu3.6Ox were ion-beam deposited onto yttria-stabilized zirconia and strontium titanate substrates from a composite target. Post-annealing processes were used to control the degree of granularity in these films, and led to films which varied in superconducting behavior. The microstructures of these films were studied by secondary electron microscopy and Auger analysis. Photoresponse and resistivity were measured as a function of temperature. We found that the degree of granularity in our films correlates with their resistivity and photoresponse which are similar to those of epitaxial or granular films.

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页码：3043 / 3046

页数：4

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