ALUMINUM-OXIDE THIN-FILMS PREPARED BY CHEMICAL VAPOR-DEPOSITION FROM ALUMINUM ACETYLACETONATE

被引：110

作者：

MARUYAMA, T

ARAI, S

机构：

[1] Department of Chemical Engineering, Faculty of Engineering, Kyoto University

来源：

APPLIED PHYSICS LETTERS | 1992年 / 60卷 / 03期

关键词：

D O I：

10.1063/1.106699

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Amorphous aluminum oxide thin films were prepared on glass and silicon (100) substrates by a low-temperature atmospheric-pressure chemical vapor deposition method. The raw material was aluminum acetylacetonate, which is nontoxic and easy to handle. The substrate temperature could be lowered to 250-degrees-C by the thermal decomposition of aluminum acetylacetonate in air.

引用

页码：322 / 323

页数：2

共 5 条

[1] DEPOSITION AND PROPERTIES OF ALUMINUM OXIDE OBTAINED BY PYROLYTIC DECOMPOSITION OF AN ALUMINUM ALKOXIDE [J].