INSTRUMENTAL NEUTRON-ACTIVATION ANALYSIS OF PROCESSED SILICON

被引：10

作者：

KEENAN, JA

GNADE, BE

WHITE, JB

机构：

[1] Texas Instruments Inc, Materials, Science Lab, Dallas, TX, USA, Texas Instruments Inc, Materials Science Lab, Dallas, TX, USA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 09期

关键词：

D O I：

10.1149/1.2114326

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

SEMICONDUCTING SILICON

引用

页码：2232 / 2236

页数：5

共 13 条

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