OXIDATION OF CHEMICALLY-VAPOR-DEPOSITED SILICON-NITRIDE AND SINGLE-CRYSTAL SILICON

被引：64

作者：

CHOI, DJ

FISCHBACH, DB

SCOTT, WD

机构：

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1989年 / 72卷 / 07期

关键词：

D O I：

10.1111/j.1151-2916.1989.tb09693.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1118 / 1123

页数：6

共 33 条

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