THE EBES4 ELECTRON-BEAM COLUMN

被引：22

作者：

THOMSON, MGR

LIU, R

COLLIER, RJ

CARROLL, HT

DOHERTY, ET

MURRAY, RG

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 01期

关键词：

D O I：

10.1116/1.583926

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：53 / 56

页数：4

共 8 条

[1] EBES4 - A NEW ELECTRON-BEAM EXPOSURE SYSTEM [J].

ALLES, DS ;

BIDDICK, CJ ;

BRUNING, JH ;

CLEMENS, JT ;

COLLIER, RJ ;

GERE, EA ;

HARRIOTT, LR ;

LEONE, F ;

LIU, R ;

MULROONEY, TJ ;

NIELSEN, RJ ;

PARAS, N ;

RICHMAN, RM ;

ROSE, CM ;

ROSENFELD, DP ;

SMITH, DEA ;

THOMSON, MGR .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01) :47-52

[2]

ALLES DS, 1975, INT ELECTRON DEVIC S, P1

[3] A FINE-LINE NMOS IC FOR RASTER-SCAN CONTROL OF A 500-MHZ ELECTRON-BEAM DEFLECTION SYSTEM [J].

BAYRUNS, RJ ;

SUCIU, PI ;

WITTWER, NC ;

FRASER, DL ;

FULS, EN ;

KUSHNER, RA ;

ASHLEY, FR ;

GERE, EA .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1982, 29 (04) :737-744

[4]

CHARBONNIER FM, 1968, Patent No. 3374386

[5] EBES - PRACTICAL ELECTRON LITHOGRAPHIC SYSTEM [J].

HERRIOTT, DR ;

COLLIER, RJ ;

ALLES, DS ;

STAFFORD, JW .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) :385-392

[6]

KUO HP, 1982, 10TH INT C EL ION BE, P481

[7]

ORLOFF J, 1984, SCANNING ELECTRON MI, V4, P1585

[8]

WOLFE JE, 1974, Patent No. 3814975

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