SOFT-X-RAY EMISSION AND INELASTIC ELECTRON-SCATTERING STUDY OF THE ELECTRONIC EXCITATIONS IN AMORPHOUS AND CRYSTALLINE SILICON DIOXIDE

被引：34

作者：

NITHIANANDAM, VJ

SCHNATTERLY, SE

机构：

来源：

PHYSICAL REVIEW B | 1988年 / 38卷 / 08期

关键词：

D O I：

10.1103/PhysRevB.38.5547

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：5547 / 5553

页数：7

共 39 条

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