INTERNAL-FRICTION AND ELECTRICAL-RESISTIVITY OF VACUUM-DEPOSITED SILVER FILMS

被引：11

作者：

UOZUMI, K ^{[1
]}

HONDA, H ^{[1
]}

YOKOTA, H ^{[1
]}

EBISU, H ^{[1
]}

机构：

[1] UNIV TOKYO,DEPT APPL PHYS,BUNKYO KU,TOKYO,JAPAN

来源：

关键词：

D O I：

10.1016/0040-6090(76)90460-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：221 / 224

页数：4

共 7 条

[1]

CORDEA JN, 1966, T METALL SOC AIME, V236, P1685

[2] LATTICE AND GRAIN BOUNDARY SELF-DIFFUSION IN SILVER [J].

HOFFMAN, RE ;

TURNBULL, D .

[3]

POSTNIKO.VS, 1972, FIZ MET METALLOVED+, V33, P210

[4]

POSTONIKOV VS, 1967, FIZ MET METALLOVED, V23, P173

[5] KINETICS OF PROCESSES DISTRIBUTED IN ACTIVATION ENERGY [J].

PRIMAK, W .

PHYSICAL REVIEW, 1955, 100 (06) :1677-1689

Vand, V .

PROCEEDINGS OF THE PHYSICAL SOCIETY, 1943, 55 :0222-0246

[7] MEASUREMENT OF INTERNAL FRICTION IN THIN FILMS [J].

WEISS, GP ;

SMITH, DO .