PRESSURE-DEPENDENCE OF THE INDIRECT BAND-GAP OF ALXGA1-XAS ALLOYS (X=0.70 AND 0.92) AT LOW-TEMPERATURES

被引:23
作者
REIMANN, K
HOLTZ, M
SYASSEN, K
LU, YC
BAUSER, E
机构
[1] Max-Planck-Institut F̈r Festkörperforschung, W-7000 Stuttgart 80
来源
PHYSICAL REVIEW B | 1991年 / 44卷 / 07期
关键词
D O I
10.1103/PhysRevB.44.2985
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have measured photoluminescence and Raman spectra of liquid-phase-epitaxy-grown Al(x)Ga(1-x)As under hydrostatic pressure (0 < P < 6 GPa) at low temperatures (T < 10 K). The X-point exciton shifts with pressure to lower energies, for an aluminum concentration of x = 0.70 at a rate of -16.2(5) meV/GPa, for x = 0.92 at -16.5(5) meV/GPa. Taking into account the pressure dependence of the exciton binding energy, we determine the pressure shift of the indirect gap in these two alloys. For x = 1 (pure AlAs), an extrapolation leads to a rate of -15.3(5) meV/GPa for the indirect gap. Using this value, data on the pressure shift of the valence-band offset in GaAs/AlAs superlattices are reexamined. This shift approaches a value of 4.7 meV/GPa for large superlattice periods (> 20 monolayers).
引用
收藏
页码:2985 / 2990
页数:6
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