FABRICATION OF PARALLEL QUASI-ONE-DIMENSIONAL WIRES USING A NOVEL CONFORMABLE X-RAY MASK TECHNOLOGY

被引:4
作者
GHANBARI, RA
CHU, W
MOON, EE
BURKHARDT, M
YEE, K
ANTONIADIS, DA
SMITH, HI
SCHATTENBURG, ML
RHEE, KW
BASS, R
PECKERAR, MC
MELLOCH, MR
机构
[1] MIT,CTR SPACE RES,CAMBRIDGE,MA 02139
[2] USN,RES LAB,NANOELECTR PROC FACIL,WASHINGTON,DC 20375
[3] PURDUE UNIV,SCH ELECT ENGN,W LAFAYETTE,IN 47907
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1992年 / 10卷 / 06期
关键词
D O I
10.1116/1.585911
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report on the fabrication of quasi-one-dimensional wires on modulation-doped GaAs/AlGaAs using a novel conformable x-ray mask technology which allows us to expose arbitrary sized samples, including samples much smaller than the membrane area, using our laboratory's standard 31 mm-diam silicon-nitride x-ray mask. After optical alignment, the sample and mask are brought into contact electrically, and then loaded into a specially designed cartridge which allows a vacuum to be pulled between mask and substrate. The vacuum causes the x-ray mask to conform around the sample. We find that a vacuum hold down is necessary to allow easy separation of the sample from the mask with minimal risk to both.
引用
收藏
页码:3196 / 3199
页数:4
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