A NEW INTERPRETATION OF END RESISTANCE MEASUREMENTS

被引:37
作者
LEE, K
SHUR, M
LEE, KW
VU, T
ROBERTS, P
HELIX, M
机构
[1] HONEYWELL INC, SYST & RES CTR, MINNEAPOLIS, MN 55413 USA
[2] HONEYWELL INC, CTR TECHNOL, BLOOMINGTON, MN 55420 USA
关键词
D O I
10.1109/EDL.1984.25810
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:5 / 7
页数:3
相关论文
共 5 条
  • [1] DETERMINATION OF THE BASIC DEVICE PARAMETERS OF A GAAS-MESFET
    FUKUI, H
    [J]. BELL SYSTEM TECHNICAL JOURNAL, 1979, 58 (03): : 771 - 797
  • [2] HOWER PL, 1973, IEEE T ELECTRON DEVI, V20
  • [3] LEE KH, UNPUB IEEE T ELECTRO
  • [4] OBTAINING THE SPECIFIC CONTACT RESISTANCE FROM TRANSMISSION-LINE MODEL MEASUREMENTS
    REEVES, GK
    HARRISON, HB
    [J]. ELECTRON DEVICE LETTERS, 1982, 3 (05): : 111 - 113
  • [5] Shockley W., 1964, RES INVESTIGATION IN