CORRUGATION ENHANCEMENT OF CU(001) INDUCED BY LOW-COVERAGE PB AND BI ADSORPTION

被引:5
作者
LI, W
VIDALI, G
机构
[1] Department of Physics, Syracuse University, Syracuse
来源
PHYSICAL REVIEW B | 1992年 / 46卷 / 07期
关键词
D O I
10.1103/PhysRevB.46.4356
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report the discovery of a metal-adatom-induced corrugation of Cu(001) studied by surface-sensitive atom beam scattering (ABS). At a Pb or Bi coverage of 0.05 (fraction of Cu layer), and while a (1 x 1) low-energy electron diffraction pattern is still observed, the ABS diffraction pattern of Cu(001) has changed considerably from that of clean Cu(001). We show that the surface has become up to 10 times more corrugated than the clean Cu(001). The nature of this metal-adatom-induced corrugation is ascribed to the redistribution of the Cu (001) surface charge density.
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页码:4356 / 4359
页数:4
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