KINETIC-BEHAVIOR OF H-ATOM AND D-ATOM IN GAMMA-IRRADIATED SIO2 AS STUDIED BY ELECTRON-SPIN-RESONANCE SPECTROSCOPY

被引：19

作者：

MIYAZAKI, T

AZUMA, N

FUEKI, K

机构：

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1984年 / 67卷 / 02期

关键词：

D O I：

10.1111/j.1151-2916.1984.tb09623.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

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页码：99 / 102

页数：4

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