INSITU RUTHERFORD BACKSCATTERING SPECTROSCOPY FOR ELECTROCHEMICAL INTERPHASE ANALYSIS

被引:16
作者
KOTZ, R [1 ]
GOBRECHT, J [1 ]
STUCKI, S [1 ]
PIXLEY, R [1 ]
机构
[1] UNIV ZURICH,INST PHYS,CH-8001 ZURICH,SWITZERLAND
关键词
D O I
10.1016/0013-4686(86)87104-3
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
11
引用
收藏
页码:169 / 172
页数:4
相关论文
共 11 条
[1]   APPLICATION OF RUTHERFORD BACKSCATTERING TO NON-DESTRUCTIVE ANALYSIS OF INSOLUBLE OXIDE ELECTRODES [J].
BATTAGLIN, C ;
CARNERA, A ;
MAZZOLDI, P ;
LODI, G ;
BONORA, P ;
DAGHETTI, A ;
TRASATTI, S .
JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1982, 135 (02) :313-319
[2]   ANISOTROPIC ETCHING OF SILICON [J].
BEAN, KE .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1978, 25 (10) :1185-1193
[3]  
Chu W. K., 1978, BACKSCATTERING SPECT
[4]   ANALYSIS OF PB ON AG BY RUTHERFORD BACKSCATTERING [J].
FRERICHS, HP ;
KALBITZER, S ;
DEMOND, FJ ;
RATH, DL ;
KOLB, DM .
SURFACE SCIENCE, 1981, 105 (2-3) :L271-L276
[5]   A REVIEW OF SURFACE SPECTROSCOPIES FOR SEMICONDUCTOR CHARACTERIZATION [J].
HELMS, CR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (04) :948-952
[6]  
MAGGIORE CJ, 1982, MAY ECS M MONTR
[7]  
MCCANE RC, 1981, J ELECTROCHEM SOC, V128, P555
[8]   CATION INSERTION REACTIONS OF ELECTROCHROMIC TUNGSTEN AND IRIDIUM OXIDE-FILMS [J].
MCINTYRE, JDE ;
BASU, S ;
PECK, WF ;
BROWN, WL ;
AUGUSTYNIAK, WM .
PHYSICAL REVIEW B, 1982, 25 (12) :7242-7254
[9]   OXIDATION OF TI THIN-FILMS DEPOSITED ON VITREOUS CARBON [J].
MULLER, R ;
WITTMER, M ;
STUCKI, S .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (07) :1537-1540
[10]   INVESTIGATION OF IONIC MOVEMENTS DURING ANODIC-OXIDATION OF SUPERIMPOSED METALLIC LAYERS BY THE USE OF RUTHERFORD BACKSCATTERING TECHNIQUES AND NUCLEAR MICROANALYSIS [J].
PERRIERE, J ;
SIEJKA, J ;
RIGO, S .
CORROSION SCIENCE, 1980, 20 (01) :91-102