MODELING OF PLASMA CHEMICAL PROCESSES IN STABLE CORONA DISCHARGES AT THIN WIRES

被引:27
作者
NAIDIS, GV
机构
[1] Institute of High Temperatures, USSR Academy of Sciences, Moscow
关键词
D O I
10.1088/0022-3727/25/3/021
中图分类号
O59 [应用物理学];
学科分类号
摘要
The generation of products of plasma chemical reactions in a stable regime of DC corona discharges at thin wires is considered. Equations are obtained for reaction rates in positive and negative discharges. It is shown that the relation between the rates of a plasma chemical reaction in positive and negative cases and the character of the rate dependence upon the wire radius are determined by the relation between the reaction energy threshold and the ionization potential of gas molecules. The estimates obtained for the rates of ozone formation in corona discharges in ambient air agree with experiment.
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页码:477 / 480
页数:4
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