We have investigated the phase equilibria in the Ho-Si system over the entire range of alloy compositions. The phase diagram has been established by means of differential thermal, X-ray and metallographic analyses. Seven intermetallic compounds have been found to exist in the system: Ho5Si3, Ho5Si4, HoSi1-x HoSi, Ho4Si5 and two Si-deficient compounds HoSi2-b and HoSi2-a. The paths of formation and the temperatures of phase transformations of all intermetallic compounds have been determined. The silicide Ho,Si, with the orthorhombic structure was discovered by us for the first time. The silicides HoSi2-a and HoSi2-b are dimorphous. The solid solubility of holmium in silicon and that of silicon in holmium are both negligible (less than 1 at.%). The electrical resistivity of both as-cast and heat-treated alloys was investigated at room temperature. Also, the temperature dependences of the electroresistivity and thermal expansion of holmium silicides were studied at temperatures up to 1050 degrees C.