HIGH TEMPERATURE HALL EFFECT IN CUPROUS OXIDE

[1] MECHANISM OF ELECTRICAL CONDUCTION IN LI-DOPED NIO [J]. PHYSICAL REVIEW, 1966, 144 (02): : 763 - +

[2] HALL EFFECT BETWEEN 300 DEGREES K AND 1100 DEGREES K IN NIO [J]. PHYSICS LETTERS, 1965, 19 (05): : 372 - &

[3] PREPARATION OF MONOCRYSTALLINE CUPROUS OXIDE [J]. JOURNAL OF APPLIED PHYSICS, 1961, 32 (10) : 2027 - &

[4] HALL EFFECT AND ELECTRICAL CONDUCTIVITY OF CU2O MONOCRYSTALS [J]. CANADIAN JOURNAL OF PHYSICS, 1966, 44 (07) : 1551 - &

[5] ELECTRICAL CONDUCTIVITY OF MONOCRYSTALLINE CUPROUS OXIDE [J]. JOURNAL OF CHEMICAL PHYSICS, 1961, 35 (04) : 1324 - &

[6] THERMODYNAMICS OF FORMATION AND MIGRATION OF DEFECTS IN CUPROUS OXIDE [J]. JOURNAL OF CHEMICAL PHYSICS, 1962, 36 (11) : 3009 - &

[7] OKEEFFE M, 1963, J PHYS SOC JAPAN S2, V18, P131

[8] Putley E. H., 1960, HALL EFFECT RELATED

[9] Schottky W, 1933, PHYS Z, V34, P858

[10] ELECTRICAL CONDUCTIVITY OF SINGLE-CRYSTAL CUPROUS OXIDE AT HIGH TEMPERATURES [J]. PHYSICAL REVIEW, 1961, 122 (02): : 482 - &

[1] MECHANISM OF ELECTRICAL CONDUCTION IN LI-DOPED NIO [J]. PHYSICAL REVIEW, 1966, 144 (02): : 763 - +

[2] HALL EFFECT BETWEEN 300 DEGREES K AND 1100 DEGREES K IN NIO [J]. PHYSICS LETTERS, 1965, 19 (05): : 372 - &

[3] PREPARATION OF MONOCRYSTALLINE CUPROUS OXIDE [J]. JOURNAL OF APPLIED PHYSICS, 1961, 32 (10) : 2027 - &

[4] HALL EFFECT AND ELECTRICAL CONDUCTIVITY OF CU2O MONOCRYSTALS [J]. CANADIAN JOURNAL OF PHYSICS, 1966, 44 (07) : 1551 - &

[5] ELECTRICAL CONDUCTIVITY OF MONOCRYSTALLINE CUPROUS OXIDE [J]. JOURNAL OF CHEMICAL PHYSICS, 1961, 35 (04) : 1324 - &

[6] THERMODYNAMICS OF FORMATION AND MIGRATION OF DEFECTS IN CUPROUS OXIDE [J]. JOURNAL OF CHEMICAL PHYSICS, 1962, 36 (11) : 3009 - &

[7] OKEEFFE M, 1963, J PHYS SOC JAPAN S2, V18, P131

[8] Putley E. H., 1960, HALL EFFECT RELATED

[9] Schottky W, 1933, PHYS Z, V34, P858

[10] ELECTRICAL CONDUCTIVITY OF SINGLE-CRYSTAL CUPROUS OXIDE AT HIGH TEMPERATURES [J]. PHYSICAL REVIEW, 1961, 122 (02): : 482 - &