KINETIC-STUDY OF DIMESITYLSILYLENE BY LASER FLASH-PHOTOLYSIS

被引：41

作者：

CONLIN, RT ^{[1
]}

NETTOFERREIRA, JC ^{[1
]}

ZHANG, S ^{[1
]}

SCAIANO, JC ^{[1
]}

机构：

[1] NATL RES COUNCIL CANADA,DIV CHEM,OTTAWA K1A 0R6,ONTARIO,CANADA

来源：

ORGANOMETALLICS | 1990年 / 9卷 / 04期

关键词：

D O I：

10.1021/om00118a074

中图分类号：

O61 [无机化学];

学科分类号：

070301 ; 081704 ;

摘要：

The rate constants for the self-reaction of dimesitylsilylene as well as for representative quenchers have been measured with laser flash photolysis techniques. Decay of the silylene, generated from 266-nm photolysis of the corresponding trisilane in cyclohexane, was monitored at 580 nm. Among the various quenchers used, the rate of reactivity with the silylene is ketone > silyl hydride > oxygen > diene > alkene > alkoxysilane. Kinetic and product studies indicate no significant deuterium isotope effect for the insertion into the Si–H(D) bond of triethylsilane. © 1990, American Chemical Society. All rights reserved.

引用

页码：1332 / 1334

页数：3

共 27 条

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