SOURCE OF ACCEPTORS IN LOW RESISTIVITY VACUUM-DEPOSITED GERMANIUM FILMS

被引：12

作者：

BYLANLER, EG

SMITH, RC

SHUBIN, LD

PIEDMONT, JR

机构：

来源：

关键词：

D O I：

10.1063/1.1729204

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3407 / &

共 9 条

[1] EPITAXY OF GERMANIUM FILMS ON GERMANIUM BY VACUUM EVAPORATION
DAVEY, JE
[J]. JOURNAL OF APPLIED PHYSICS, 1962, 33 (03) : 1015 - &
[2] DAVEY JE, TO BE PUBLISHED
[3] GUTIERREZ WA, PRIVATE COMMUNICATIO
[4] GUTIERREZ WA, 1962, B AM PHYS SOC, V2, P558
[5] KUROV GA, 1957, SOV PHYS-CRYSTALLOGR, V2, P53
[6] REIZMAN F, 1962, METALLURGY SEMICONDU, P169
[7] GERMANIUM SOLIDUS CURVES
THURMOND, CD
TRUMBORE, FA
KOWALCHIK, M
[J]. JOURNAL OF CHEMICAL PHYSICS, 1956, 25 (04) : 799 - 800
[8] GERMANIUM FILMS ON GERMANIUM OBTAINED BY THERMAL EVAPORATION IN VACUUM
WEINREICH, O
TUFTS, C
DERMIT, G
[J]. JOURNAL OF APPLIED PHYSICS, 1961, 32 (06) : 1170 - &
[9] PREPARATION OF CRYSTALLINE GERMANIUM FILMS ON METALS
WEINREICH, OA
DERMIT, G
[J]. JOURNAL OF APPLIED PHYSICS, 1963, 34 (01) : 225 - &