RESISTIVE MHD STUDIES OF HIGH BETA-TOKAMAK PLASMAS

被引:28
作者
LYNCH, VE
CARRERAS, BA
HICKS, HR
HOLMES, JA
GARCIA, L
机构
关键词
D O I
10.1016/0010-4655(81)90170-3
中图分类号
TP39 [计算机的应用];
学科分类号
081203 ; 0835 ;
摘要
引用
收藏
页码:465 / 476
页数:12
相关论文
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